Deposition

Thin Film Technology, Inc. uses a broad range of custom-tooled vacuum systems and deposition techniques to meet the customer's specific and volume requirements. To maintain this flexibility, we employ:

• Electron-beam evaporation systems, equipped with substrate heating and glow discharge cleaning, and capable of depositing up to four different materials in one pumpdown.
• R.F./D.C. magnetron sputtering systems, with sputter etching, R.F. substrate bias, and reactive sputtering capable of depositing up to four different materials during the same pumpdown.
• Quartz crystal and optical monitors for tight control of film deposition rate and thickness.
• Residual gas analyzers for in-process monitoring of the deposition.
• A wide inventory of evaporation and sputtering materials with known characteristics

Large System Capabilities

To meet the needs of aerospace, optical, and other industries with large parts, we offer:

• Systems with usable sizes from 4 feet in diameter by 4 feet long to 8 feet in diameter by 14 feet long.
• Multiple deposition sources with quartz crystal monitoring for rate and thickness control of films.
• Existing tooling designed for quick adaptability to obtain uniform depositions on various size parts.
• In house engineering expertise in process development, documentation, and vacuum tooling design coupled with experience in coating large, unusually shaped parts.
• In house machining and welding capability for constructing unique vacuum tooling for prototype or volume production requirements.